2-Oxo-2-[(5-oxo-4-oxatricyclo[4.2.1.03,?]nonan-2-yl)oxy]ethyl Methacrylate NEW

2-Oxo-2-[(5-oxo-4-oxatricyclo[4.2.1.0³,⁷]nonan-2-yl)oxy]ethyl Methacrylate   347886-81-1

Synonyms:MNLMA

Appearance:White to light yellow crystalline powder

Purity:99%min 

Physical and Chemical Properties

• Molecular formula: C₁₄H₁₆O₆

• Molecular weight: 280.28 g/mol

• Melting point: 74.0 – 78.0 °C

• Density: 1.3 ± 0.1 g/cm³

• Boiling point: 444.8 ± 30.0 °C (760 mmHg)

• Solubility: Soluble in polar aprotic solvents (DMF, NMP); insoluble in water

• Stability: Polymerizable under heat/light/initiators; store inhibited, cool & sealed

Uses

• High-performance monomer for 193nm ArF photoresist polymers in semiconductor lithography

• Improves polymer’s etching resistance, thermal stability, and resolution performance

• Used in advanced photoresist formulations for high-precision microchip manufacturing

• Key raw material for functional acrylic resins requiring high thermal & chemical resistance

HS Code

• HS Code: 2916149090