(4-Hydroxy-2-methyl)phenylboronic acid NEW

Henan Fengda Chemical Co., Ltd. a research customization and supplier specializing in PPb grade ultra-high purity electronic chemicals, deeply rooted in the semiconductor and new display fields, committed to providing the most core and purest chemical components for photoresist and high-end display materials. We provide key monomers for KrF/ArF photoresist, photoacid generators (PAGs), photoacids, and etching solution raw materials, providing cornerstone materials for advanced process photoresist formulations; We take ICP-MS full spectrum metal impurity analysis as the quality cornerstone and provide ICP-MS metal impurity COA reports to meet the strict industry requirements for PPb grade electronic chemical materials. The COA report contains important data such as NA, Mg, K, Ca, Al, Cr, Fe, Ni, Cu, Zn, Pb, Ag, etc. To provide customers with pure and reliable source assurance for cutting-edge research and stable production.