Literature: Cheng, Spencer; Hawley, M. Dale Journal of Organic Chemistry, 1986 , vol. 51, # 20 p. 3799 - 3804
Precursor & DownStream
Precursor 8
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CAS#:119-61-9 Benzophenone
CAS#:574-66-3 Benzophenone oxime
CAS#:7803-57-8 Hydrazine hydrate
CAS#:14066-73-0 Hydrazinecarbox...
DownStream 10
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CAS#:107783-08-4 2-(benzhydrylid...
CAS#:360-11-2 DIFLUORODIPHENY...
CAS#:579-55-5 [fluoro(phenyl)...
CAS#:119-61-9 Benzophenone
Customs
HS Code
2928000090
Summary
2928000090 other organic derivatives of hydrazine or of hydroxylamine VAT:17.0% Tax rebate rate:9.0% Supervision conditions:none MFN tariff:6.5% General tariff:20.0%
Articles1
More Articles
Solid-phase synthesis of C-terminal azapeptides.
J. Pept. Sci. 21 , 387-91, (2015)
The solid-phase synthesis of azapeptides possessing a C-terminal aza-residue has been accomplished by a protocol featuring regioselective alkylation of benzhydrylidene-aza-glycinamide and illustrated ...
Synonyms
EINECS 226-321-8
Starting for diphenyldiazomethane
diphenyl-methanonhydrazone
diphenyl hydrazone
(Diphenylmethylene)hydrazine
(diphenylmethylidene)hydrazine
HYDRAZINE OF BENZOPHENONE
MFCD00007624
Benzophenoneimine N-amino
Benzophenone hydrazo
diphenylketonehydrazone
Benzophenone hydrozone
1-Benzhydrylidenehydrazine
Diphenyldiazomethane precursor
Diphenyl-methanone Hydrazone
Methanone, diphenyl-, hydrazone
diphenylketohydrazone
benzophenonehydrazone
2. Packaging of materials
For powders: normal is 25kgs/Drum or bag, or larger/smaller package as request.
For liquids: normal 25kgs/drum, 180-300kgs/bucket, or IBC, determined by the nature of the product.
Or smaller package 1kg/bottle, 10kgs/bottle as request.
Henan Fengda Chemical Co., Ltd. a research customization and supplier specializing in PPb grade ultra-high purity electronic chemicals, deeply rooted in the semiconductor and new display fields, committed to providing the most core and purest chemical components for photoresist and high-end display materials.
We provide key monomers for KrF/ArF photoresist, photoacid generators (PAGs), photoacids, and etching solution raw materials, providing cornerstone materials for advanced process photoresist formulations;
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