Product Introduction
Product Name: Triphenylsulfonium Nonafluorobutanesulfonate
Chemical Name: Triphenylsulfonium Nonaflate
CAS No.: 144317-44-2
Molecular Formula: C₂₂H₁₅F₉O₃S₂
Molecular Weight: 562.5 g/mol
Overview:
Triphenylsulfonium nonaflate is a high-performance Photoacid Generator (PAG) . It serves as a critical component in photoresist formulations for deep ultraviolet (DUV) lithography (e.g., 193nm, 248nm). Upon exposure, it efficiently generates a strong acid (nonafluorobutanesulfonic acid) to catalyze the chemical amplification reaction, enabling precise pattern development and transfer. It is an indispensable key chemical in micro- and nano-fabrication for semiconductors, flat-panel displays, and more .
Key Advantages:
High Purity & Electronic Grade: Our product boasts a purity of ≥99.9% with extremely low levels of metallic ions and other impurities, meeting the stringent requirements of advanced semiconductor nodes (e.g., 7nm and below) to ensure high-resolution patterning and low defect rates .
Superior Process Performance: The generated nonafluorobutanesulfonic acid offers strong acidity and controllable diffusion characteristics, contributing to excellent sidewall profiles and high-resolution lithographic patterns . It also exhibits excellent thermal stability (decomposition temperature >180°C), suitable for post-exposure bake steps .
Stable Scale-Up Supply: As a domestic manufacturer with in-house production capabilities, we guarantee stable and continuous supply from gram to kilogram scale with flexible packaging options, securing your R&D and production supply chain.
Significant Cost Advantage: Leveraging optimized local manufacturing and supply chains, we provide this high-end lithography material at a more competitive price compared to imported equivalents, helping customers reduce overall production costs.
Specifications:
Appearance: White to pale yellow powder
Melting Point: 84-88 °C
Solubility: Readily soluble in common organic solvents such as methanol, acetone, and acetonitrile
Thermal Decomposition Temperature: >180°C
Purity: ≥99.9% (Electronic Grade)
Primary Applications:
Semiconductor Lithography: As a core PAG in chemically amplified resists for DUV and EUV lithography, essential for manufacturing advanced logic chips and memory devices .
Advanced Packaging & Microelectronics: Used in high-precision patterning processes for advanced packaging (e.g., under-bump metallization, redistribution layers) and MEMS device fabrication .
Flat-Panel Display Manufacturing: Applied in the fabrication of high-resolution OLED displays for fine metal mask or thin-film transistor array patterning .
Cutting-Edge Research: Functions as an efficient electron injection layer material to enhance the performance of polymer light-emitting diodes (PLEDs) ; also used in developing specialized functional devices like radiation dosimetry sensors .
Packaging & Storage:
Available in various clean, sealed packages such as 100mg, 1g, and 5g. Customized packaging is available upon request. This product is light- and moisture-sensitive. Recommend storage at -20°C, sealed, and protected from light.
We welcome inquiries, technical discussions, collaboration, and sample requests from all customers and partners in the semiconductor, photoresist, display panel, and related industries!
Yurui(Shanghai) Chemical Co. Ltd / UIV Chem
Contact Person: Nan Haodong
Address: Floor 5, Building H2, No.3188 Xiupu Rd, Pudong, Shanghai 201203, China
Tel: 0086-21-50456736 / 021-33191321
WhatsApp: +86 17613296318
WeChat: NHDong2021
Email: xin@riyngroup.com
QQ: 2551819264
Website: www.riyngroup.com
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